Lithographic apparatus and device manufacturing method

The invention discloses am immersion lithographic apparatus and a device manufacturing method. The immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system i...

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Bibliographische Detailangaben
Hauptverfasser:	STEFFENS KOEN, JANSSEN FRANCISCUS JOHANNES JOSEPH, DE GRAAF ROELOF FREDERIK, SIMONS WILHELMUS FRANCISCUS JOHANNES, BRANDS GERT JAN GERARDUS JOHANNES THOMAS, DE METSENAERE CHRISTOPHE, MIRANDA MARCIO ALEXANDRE CANO, VAN LIEROP MATHIEUS ANNA KAREL, BERKVENS PAUL PETRUS JOANNES, DIRECKS DANIEL JOZEF MARIA, SPRUYTENBURG PATRICK JOHANNES WILHELMUS, LEIBREGTS PAULUS MARTINUS MARIA, VERSTRAETE JORIS JOHAN ANNE MARIE, LEMPENS HAN HENRICUS ALDEGONDA, VAN DER HAM RONALD, SCHOLTES PAUL WILLIAM
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention discloses am immersion lithographic apparatus and a device manufacturing method. The immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.