Adjacent exposure device, forming method of exposure beam and manufacturing method of panel substrate
The invention provides an adjacent exposure device, a forming method of an exposure beam and a manufacturing method of a panel substrate. A reflection component (50) is arranged surrounding an optical path from a plurality of amplifying lenses (43) to a fly lens (45). A semiconductor luminous elemen...
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| creator | YOSHITAKE YASUNOBU DOI HIDEAKI HARIYAMA TATSUO TETSUKA HIDEKAZU NEMOTO RYOJI |
| description | The invention provides an adjacent exposure device, a forming method of an exposure beam and a manufacturing method of a panel substrate. A reflection component (50) is arranged surrounding an optical path from a plurality of amplifying lenses (43) to a fly lens (45). A semiconductor luminous element (42) carried on a peripheral part of a base substrate (51) and the amplifying lenses (43) corresponding to the semiconductor luminous element are configured that one end of the light generated from the semiconductor luminous element (42) and amplified by the corresponding amplifying lenses (43) is entered into the fly lens (45) in a regulated angle of a radiating surface which is not deviated from the fly lens (45). And the reflection component (50) is configured that the other end of the light generated from the semiconductor luminous element (42) carried on a peripheral part of a base substrate (41) and amplified by the corresponding amplifying lenses (43) is entered into the fly lens (45) in a regulated angle |
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A reflection component (50) is arranged surrounding an optical path from a plurality of amplifying lenses (43) to a fly lens (45). A semiconductor luminous element (42) carried on a peripheral part of a base substrate (51) and the amplifying lenses (43) corresponding to the semiconductor luminous element are configured that one end of the light generated from the semiconductor luminous element (42) and amplified by the corresponding amplifying lenses (43) is entered into the fly lens (45) in a regulated angle of a radiating surface which is not deviated from the fly lens (45). 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Adjacent exposure device, forming method of exposure beam and manufacturing method of panel substrate |
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