Adjacent exposure device, forming method of exposure beam and manufacturing method of panel substrate

The invention provides an adjacent exposure device, a forming method of an exposure beam and a manufacturing method of a panel substrate. A reflection component (50) is arranged surrounding an optical path from a plurality of amplifying lenses (43) to a fly lens (45). A semiconductor luminous elemen...

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Bibliographische Detailangaben
Hauptverfasser: YOSHITAKE YASUNOBU, DOI HIDEAKI, HARIYAMA TATSUO, TETSUKA HIDEKAZU, NEMOTO RYOJI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides an adjacent exposure device, a forming method of an exposure beam and a manufacturing method of a panel substrate. A reflection component (50) is arranged surrounding an optical path from a plurality of amplifying lenses (43) to a fly lens (45). A semiconductor luminous element (42) carried on a peripheral part of a base substrate (51) and the amplifying lenses (43) corresponding to the semiconductor luminous element are configured that one end of the light generated from the semiconductor luminous element (42) and amplified by the corresponding amplifying lenses (43) is entered into the fly lens (45) in a regulated angle of a radiating surface which is not deviated from the fly lens (45). And the reflection component (50) is configured that the other end of the light generated from the semiconductor luminous element (42) carried on a peripheral part of a base substrate (41) and amplified by the corresponding amplifying lenses (43) is entered into the fly lens (45) in a regulated angle