Film forming system and film forming method

According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object pl...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TOKUMOTO TAKAO, NATSU SADAO, IWASAKI SOUICHIROU, SATO TSUYOSHI, OOSHIRO KENICHI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.