Silicon leakage prevention device for polysilicon ingot furnace or polysilicon purification furnace
The invention relates to a silicon leakage prevention device for a polysilicon ingot furnace or a polysilicon purification furnace, belonging to the technical field of the design and the manufacture of parts used in polysilicon ingot furnaces or polysilicon purification furnaces. In the invention, a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a silicon leakage prevention device for a polysilicon ingot furnace or a polysilicon purification furnace, belonging to the technical field of the design and the manufacture of parts used in polysilicon ingot furnaces or polysilicon purification furnaces. In the invention, a graphite crucible without silicon leakage is developed to replace a commonly used combined type graphite crucible used for protection outside a quartz crucible, thus the danger of the silicon liquid leakage caused by factors of accidental fracture of the quartz crucible, and the like cannot occur in ingots, and severe loss of equipment and materials cannot be caused. The device has the obvious advantage of low cost and can be repeatedly used. The device consists of an upper layer crucible and a lower layer crucible, and the peripheries of the upper layer crucible and the lower layer crucible respectively consist of four graphite plates, wherein the lower layer crucible comprises a bottom graphite plate, and the fo |
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