Method for the treatment of a semiconductor wafer

The present invention relates to a method for the treatment of a semiconductor wafer (5). Semiconductor wafers (5) are treated in a liquid container (11) filled at least partly with a solution (91) containing hydrogen fluoride, such that surface oxide dissolves, are transported out of the solution (...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SOLLINGER FRANZ, SCHWAB GUENTER, LUTHE HANS-JOACHIM, BUSCHHARDT THOMAS, FEIJOO DIEGO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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