Cathode discharge device
The invention provides a cathode discharge device, which comprises an anode, a cathode and a plurality of cathode chambers, wherein the cathode is positioned in the anode; the anode is internally provided with a plurality of gas flow passages and at least one passage through hole, and the gas flow p...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a cathode discharge device, which comprises an anode, a cathode and a plurality of cathode chambers, wherein the cathode is positioned in the anode; the anode is internally provided with a plurality of gas flow passages and at least one passage through hole, and the gas flow passages are communicated by the passage through hole; and the cathode chambers are positioned in the cathode, each cathode chamber is provided with a chamber gas inlet and a chamber gas outlet, and each cathode chamber is communicated with the gas flow passage through the chamber gas inlet. The invention can be applied to the hollow cathode discharge plasma source device of large area membrane manufacture process of the optoelectronic device of the solar battery and the like, the plasma has the characteristic of high degree of homogeneity and high degree of mineral liberation through the pressure stabilizing function of the working gas passage, the invention also can improve membrane forming rate, greatly improves |
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