Method for forming microscopic structures on a substrate

Method for forming microscopic structures on a substrate

The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality laye...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KESSELS WILHELMUS MATHIJS MARIE, JONG ALAN FRANK DE, MULDERS JOHANNES JACOBUS LAMBERTUS, MACKUS ADRIAAN JACOBUS MARTINUS
Format: Patent
Sprache:eng
Schlagworte:
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
TRANSPORTING
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Beschreibung
Zusammenfassung:The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.