Device and technology for reducing thickness of surface oxidation layer of positive cylinder of permatron
The invention relates to a technical device for reducing thickness of the surface oxidation layer of a positive cylinder of a permatron. The device comprises the positive cylinder and is characterized in that a positive sleeve is sleeved on the outside of the positive cylinder, the positive sleeve i...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a technical device for reducing thickness of the surface oxidation layer of a positive cylinder of a permatron. The device comprises the positive cylinder and is characterized in that a positive sleeve is sleeved on the outside of the positive cylinder, the positive sleeve is made from a material of which expansion coefficient is less than that of copper, and the positivesleeve is fitted with the positive cylinder through a small gap between the two devices. The invention also relates to a technology for reducing thickness of the surface oxidation layer of the positive cylinder of the permatron and comprises the following steps: 1. sleeving the positive sleeve on the outside of the positive cylinder at room temperature; 2. placing the permatron sleeved with the positive sleeve in an exhausting device, heating the exhausting device, discharging the air in the positive cylinder of the permatron at high temperature to ensure that the positive cylinder is in the vacuum state, then cooling |
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