Vacuum processor

The invention discloses a vacuum processor, which is used for processing etching or spraying on a substrate, such as glass of an LCD, a semiconductor chip and the like, and comprises a lower cover and an upper which are separably connected with each other to form a vacuum processing space, a pair of lower horizontal moving units which are respectively mounted on each sides of the lower cover, a pair of upper horizontal moving units each connected with the lower horizontal moving unit and upper cover thereof respectively for horizontally moving the upper cover to separate the upper cover from the lower cover, and an elevating unit passing through the lower horizontal moving unit and arranged thereon, separating the upper cover from the lower cover or connecting the upper cover with the lower cover through elevating or dropping the upper horizontal moving units.