Radiation system and lithographic apparatus

A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage dif...

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Hauptverfasser: IVANOV VLADIMIR VITALEVITCH, SOER WOUTER ANTHON, WASSINK ARNOUD CORNELIS, BANINE VADIM YEVGENYEVICH, KLUNDER DERK JAN WILFRED, GLUSHKOV DENIS, KRIVTSUN VLADIMIR MIHAILOVITCH, VAN HERPEN MAARTEN MARINUS JOH, BROM PAUL PETER ANNA ANTONIUS, CADEE THEODORUS PETRUS MARIA, KOSHELEV KONSTANTIN NIKOLAEVIT
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.