Lithographic projection apparatus and a method of operating the same

The present invention discloses a lithographic projection apparatus and a method of operating the same. A lithographic projection apparatus is also disclosed which includes a cleaning station. Severalembodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid con...

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Bibliographische Detailangaben
Hauptverfasser:	JANSEN HANS, VAN DOMMELEN YOURI JOHANNES LA, VAN DE WINKEL JIMMY MATHEUS WILHELMUS, DE JONG ANTHONIUS MARTINUS CORNELIS, JACOBS JOHANNES HENRICUS WILHELMUS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, WATSO ROBERT DOUGLAS, STEIJAERT PETER PAUL, TANASA GHEORGHE, VAN LIER HENRICUS MARTINUS DOR, DA PAZ SENA JOAO PAULO, MERTENS JEROEN JOHANNES SOPHIA, VAN DER LEE MAURICE MARTINUS JOHANNES
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention discloses a lithographic projection apparatus and a method of operating the same. A lithographic projection apparatus is also disclosed which includes a cleaning station. Severalembodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.