Apparatus and method of measuring film thickness
The present invention provides an apparatus and method of measuring film thickness, capable of detecting film thickness of detected objects with birefringence stability and continuously. The film thickness measuring apparatus (1) includes spectrometry part (10) for splitting the reflected light obta...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The present invention provides an apparatus and method of measuring film thickness, capable of detecting film thickness of detected objects with birefringence stability and continuously. The film thickness measuring apparatus (1) includes spectrometry part (10) for splitting the reflected light obtained by the measured film F irradiation white light and measuring reflection spectroscopy; operation part (20) for applying set operation to measured reflection spectroscopy and measuring the measured film F thickness. The operation part (20) includes wave-digital conversion part (23) for converting reflection spectroscopy of preset wavelength zone in the reflection spectroscopy into reset wave-digital spaced wave number domain reflection spectroscopy; fourier conversion part (24) for converting wave number domain reflection spectroscopy into power spectrum; calculate part (peak detecting part (25), weighting average part (26), and film thickness calculation part (27) ), determining centroid position of peak in the |
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