Safety, monitoring and control system for thermal reactor
In one or more aspects, a thermal reactor apparatus is provided that may be used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention may include a system comprising a control...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | In one or more aspects, a thermal reactor apparatus is provided that may be used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention may include a system comprising a controller, a reaction chamber adapted to be controlled by the controller, a conduit into the reaction chamber, a pilot disposed at a first end of the conduit within the reaction chamber, a sensor disposed at a second end of the conduit outside of the reaction chamber that is coupled to the controller and adapted to provide an indication to the controller whether the pilot is lit, and an actuator operable to open and close the conduit. Numerous other aspects of the invention are disclosed. |
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