Lithographic apparatus immersion damage control
A lithographic apparatus is disclosed, including a substrate table to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a fluid supply system to supply an immersion fluid to a space between a downstream lens of the projection system a...
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| creator | VAN VLIET ROBERTUS JOHANNES HANEGRAAF ROLAND PETRUS HENDRI NIHTIANOV STOYAN VAN DER MEULEN FRITS HOUKES MARTIJN COX HENRIKUS HERMAN MARIE KEMPER PETRUS WILHELMUS JOSEPH |
| description | A lithographic apparatus is disclosed, including a substrate table to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a fluid supply system to supply an immersion fluid to a space between a downstream lens of the projection system and the substrate; and a leakage detection system to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system includes two mutually insulating electric conductors that are arranged a potential leakage region of the fluid supply system, the leakage detection system is configured to detect the leakage by measuring capacitance between the mutually insulating electric conductors. |
| format | Patent |
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a projection system to project a patterned radiation beam onto a target portion of the substrate; a fluid supply system to supply an immersion fluid to a space between a downstream lens of the projection system and the substrate; and a leakage detection system to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system includes two mutually insulating electric conductors that are arranged a potential leakage region of the fluid supply system, the leakage detection system is configured to detect the leakage by measuring capacitance between the mutually insulating electric conductors.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus immersion damage control |
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