Lithographic apparatus immersion damage control

A lithographic apparatus is disclosed, including a substrate table to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a fluid supply system to supply an immersion fluid to a space between a downstream lens of the projection system and the substrate; and a leakage detection system to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system includes two mutually insulating electric conductors that are arranged a potential leakage region of the fluid supply system, the leakage detection system is configured to detect the leakage by measuring capacitance between the mutually insulating electric conductors.