Method for producing ITO target material by hot isostatic pressing
The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment proc...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | PENG XIAOSU CHEN LISAN CHEN WEIFEI SHE XU CHEN JUNHUI LI PENGFEI |
| description | The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment process. Therefore, the reaction of target materials and a bag sleeve is avoided; stripping can be carried out conveniently; the yield of finished products of target materials can be improved; and the method is suitable for industrial development. The relative density of pressed target materials can reach more than 99 percent. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN101407904A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN101407904A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN101407904A3</originalsourceid><addsrcrecordid>eNrjZHDyTS3JyE9RSMsvUigoyk8pTc7MS1fwDPFXKEksSk8tUchNLEktykzMUUiqVMjIL1HILM4vLkksyUwGKk8tLgaq5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgaGJgbmlgYmjsbEqAEAHlEx1g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for producing ITO target material by hot isostatic pressing</title><source>esp@cenet</source><creator>PENG XIAOSU ; CHEN LISAN ; CHEN WEIFEI ; SHE XU ; CHEN JUNHUI ; LI PENGFEI</creator><creatorcontrib>PENG XIAOSU ; CHEN LISAN ; CHEN WEIFEI ; SHE XU ; CHEN JUNHUI ; LI PENGFEI</creatorcontrib><description>The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment process. Therefore, the reaction of target materials and a bag sleeve is avoided; stripping can be carried out conveniently; the yield of finished products of target materials can be improved; and the method is suitable for industrial development. The relative density of pressed target materials can reach more than 99 percent.</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090415&DB=EPODOC&CC=CN&NR=101407904A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090415&DB=EPODOC&CC=CN&NR=101407904A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PENG XIAOSU</creatorcontrib><creatorcontrib>CHEN LISAN</creatorcontrib><creatorcontrib>CHEN WEIFEI</creatorcontrib><creatorcontrib>SHE XU</creatorcontrib><creatorcontrib>CHEN JUNHUI</creatorcontrib><creatorcontrib>LI PENGFEI</creatorcontrib><title>Method for producing ITO target material by hot isostatic pressing</title><description>The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment process. Therefore, the reaction of target materials and a bag sleeve is avoided; stripping can be carried out conveniently; the yield of finished products of target materials can be improved; and the method is suitable for industrial development. The relative density of pressed target materials can reach more than 99 percent.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDyTS3JyE9RSMsvUigoyk8pTc7MS1fwDPFXKEksSk8tUchNLEktykzMUUiqVMjIL1HILM4vLkksyUwGKk8tLgaq5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgaGJgbmlgYmjsbEqAEAHlEx1g</recordid><startdate>20090415</startdate><enddate>20090415</enddate><creator>PENG XIAOSU</creator><creator>CHEN LISAN</creator><creator>CHEN WEIFEI</creator><creator>SHE XU</creator><creator>CHEN JUNHUI</creator><creator>LI PENGFEI</creator><scope>EVB</scope></search><sort><creationdate>20090415</creationdate><title>Method for producing ITO target material by hot isostatic pressing</title><author>PENG XIAOSU ; CHEN LISAN ; CHEN WEIFEI ; SHE XU ; CHEN JUNHUI ; LI PENGFEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101407904A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2009</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>PENG XIAOSU</creatorcontrib><creatorcontrib>CHEN LISAN</creatorcontrib><creatorcontrib>CHEN WEIFEI</creatorcontrib><creatorcontrib>SHE XU</creatorcontrib><creatorcontrib>CHEN JUNHUI</creatorcontrib><creatorcontrib>LI PENGFEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PENG XIAOSU</au><au>CHEN LISAN</au><au>CHEN WEIFEI</au><au>SHE XU</au><au>CHEN JUNHUI</au><au>LI PENGFEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for producing ITO target material by hot isostatic pressing</title><date>2009-04-15</date><risdate>2009</risdate><abstract>The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment process. Therefore, the reaction of target materials and a bag sleeve is avoided; stripping can be carried out conveniently; the yield of finished products of target materials can be improved; and the method is suitable for industrial development. The relative density of pressed target materials can reach more than 99 percent.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN101407904A |
| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Method for producing ITO target material by hot isostatic pressing |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T03%3A32%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PENG%20XIAOSU&rft.date=2009-04-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN101407904A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |