Method for producing ITO target material by hot isostatic pressing

The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment proc...

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Bibliographische Detailangaben
Hauptverfasser:	PENG XIAOSU, CHEN LISAN, CHEN WEIFEI, SHE XU, CHEN JUNHUI, LI PENGFEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method of ITO target material by a hot isostatic pressing method, which is characterized in that the ITO powder lot used is calcined at the temperature of not less than 1000 DEG C, and graphite paper is adopted as a bond breaker in the hot isostatic pressing treatment process. Therefore, the reaction of target materials and a bag sleeve is avoided; stripping can be carried out conveniently; the yield of finished products of target materials can be improved; and the method is suitable for industrial development. The relative density of pressed target materials can reach more than 99 percent.