Monitoring system and monitoring method of photoetching machine

The invention provides a monitoring system for a photoetching machine, which comprises an energy stability monitoring system and a focal point stability monitoring system. Either of the energy stability monitoring system and the focal point stability monitoring system comprises a plurality of wafers. The energy stability monitoring system shares a group of wafers with the focal point stability monitoring system. Parts of the wafers in the shared group of wafers complete the monitoring of the energy stability of the photoetching machine, the measurement of key line breadths, the monitoring of the stability of the best focal plane, and the measurement of key line breadths corresponding to different focal points. The monitoring system plays a role in the reduction of the resource expenditure, as the energy stability monitoring system and the focal point stability monitoring system share a plurality of wafers. In addition, the total workload of the wafers in the monitoring system is reduced, the work efficiency i