Substrate treating device
This invention provides a substrate processing device which cannot cause the large and complication of the device and is able to enable the providing position and the position of taking out of the substrate to be the same. The substrate processing device includes: a roller conveyor (8) that conveys...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | This invention provides a substrate processing device which cannot cause the large and complication of the device and is able to enable the providing position and the position of taking out of the substrate to be the same. The substrate processing device includes: a roller conveyor (8) that conveys the substrate back and forth in straight line corresponding to the horizontal direction; a loader section (2) that is configured to one end side of the roller conveyor and provides an unsettled substrate; a washing treating part (11) which carries out washing processing of the unsettled substrate which was supplied from this loader section and conveyed by the roller conveyor; a humidifying knife (21) for utilizing the treating solution to humidify the substrate before providing the unsettled substrate to the washing treating part; a drying knife (22) for injecting gas to dry the substrate when taking out the unsettled substrate treated by the washing treating part by the roller conveyor; and an unloader part (3) th |
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