Positive photoresist

The invention discloses a plus photoresist which comprises resin, an additive and a solvent, wherein, the solvent of the plus photoresist comprises at least two kinds of solvent with different boiling points.

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Bibliographische Detailangaben
Hauptverfasser:	YANG ZONGMU, CAI ZHEHUI, GUO GUANGLANG, SHIODA EIWA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention discloses a plus photoresist which comprises resin, an additive and a solvent, wherein, the solvent of the plus photoresist comprises at least two kinds of solvent with different boiling points.