Production method of hatch and interlayer window hatch

The invention is a method for manufacturing an opening, comprising the steps that: a substrate is provided, which has a conducting part at least including a conductor layer and a protecting layer from bottom to top and a dielectric layer covering the conducting part; with reaction gas containing hig...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAN JINGREN, LUO WENXUN, QIU YONGHAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The invention is a method for manufacturing an opening, comprising the steps that: a substrate is provided, which has a conducting part at least including a conductor layer and a protecting layer from bottom to top and a dielectric layer covering the conducting part; with reaction gas containing high polymer gas, a first dry etching is carried on the dielectric layer, an opening is formed on the protecting layer, the bottom part of the opening has an initial size, and the angle between the opening bottom and the inner wall of the opening is an obtuse angle; the opening is enlarged, so that the bottom part of the opening has the objective size larger than the initial size, and the opening at least does not bear the conductor layer.