Exposure apparatus and method for producing device

The invention provides an exposure device which is capable of restraining apparatus deterioration resulted from liquid attached to a base plate, during exposure by filling liquid between a projection optical system and the base plate. An apparatus manufacturing system (SYS) is provided with: an expo...

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Bibliographische Detailangaben
1. Verfasser:	UMAGOME NOBUTAKA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides an exposure device which is capable of restraining apparatus deterioration resulted from liquid attached to a base plate, during exposure by filling liquid between a projection optical system and the base plate. An apparatus manufacturing system (SYS) is provided with: an exposure device body (EX) which projects patterns on the base plate (P) via the projection optical system (PL) and liquid (50) by filling the fluid (50) between the projection optical system (PL) and the base plate (P); an interface unit (IF) of the exposure device body (EX) and a coater/developer body(C/D) which performing treatment after exposure of the base plate (P); and a liquid removing device (100) which removes the liquid (50) attached to the base plate (P) after exposure of the base plate(P) and before the base plate (P) is moved out to the coater/developer body (C/D) by the interface unit (IF).