Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same

Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same

A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).

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Bibliographische Detailangaben
Hauptverfasser: LI YONGGUO, JIN RUNZHU, LIU SHENGGAO, ZHENG ZEMO, LI SHANSHU, JIN CHANGJUN, AN JISHUO, CHENG QIHUAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Beschreibung
Zusammenfassung:A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).