Image sensing device and manufacturing method thereof

Image sensing device and manufacturing method thereof

An image-sensing device includes a substrate, at least one optic component, at least one dielectric layer and at least a waveguide set above the optic component. Sidewall of the waveguide is set with a optic-shielding layer, and the waveguide is embedded with a filling layer. Therefore, the device c...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KE DENGYUAN, CHEN KUNZHU, PENG NIANZU
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:An image-sensing device includes a substrate, at least one optic component, at least one dielectric layer and at least a waveguide set above the optic component. Sidewall of the waveguide is set with a optic-shielding layer, and the waveguide is embedded with a filling layer. Therefore, the device can effectively shorten optic path, focus light, and avoid bridging phenomenon between different optic paths to improve sensitivity of the image-sensing device.