Slurry dispensing system and method thereof

A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the...

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Bibliographische Detailangaben
Hauptverfasser:	CHU HUI-MING, TAN PAUL, CHEN CHOING, HSU MING-TZUNG, CHEN CHIANG-JEH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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Beschreibung
Zusammenfassung:	A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the first supply station and the second supply station. The first valve connects the first loop to points of use. The second valve connects the second loop to the points of use. When slurry is supplied to the first loop from the first slurry station, slurry is supplied to the second loop from the second slurry station. When the first valve is opened and the second valve is closed, slurry is supplied to the points of use from the first loop.