Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology

A description is given of a method and an apparatus for generating radiation (12) in the wavelength range from about 1 nm to about 30 nm by means of an electrically operated discharge, which can be used in lithography or in metrology. Use is made of at least one first electrode (14) and at least one...

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1. Verfasser: JONKERS JEROEN,VAUDREVANGE DOMINIK MARCEL
Format: Patent
Sprache:eng
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Zusammenfassung:A description is given of a method and an apparatus for generating radiation (12) in the wavelength range from about 1 nm to about 30 nm by means of an electrically operated discharge, which can be used in lithography or in metrology. Use is made of at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, wherein at least one working gas (22) is provided between the electrodes (14, 16). A plasma is ignited in the working gas (22), the generated radiation (12) of which plasma is forwarded via a first opening (30) for further use, and wherein debris particles (28) are produced in at least one region (26) of at least one of the electrodes (14, 16). In order to retain the debris particles (28), the method is configured such that at least the region (26) is arranged with respect to the first opening (30) in such a way that the movement paths (32) of the debris particles (28) run at least predominantly outside an area delimited by the first opening (30).