Electrochemical device

Electrochemical device

An electrochemical device comprising: (a) a semiconductor layer, wherein the semiconductor is silicon or silicon carbide, and where the layer has a thickness from 1 to 1000 [mu]m; (b) a TiO2 layer on the semiconductor layer, where the layer may include an alkaline earth oxide MO up to an amount wher...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: CHRISTENSEN PAUL ANDREW,WRIGHT NICHOLAS GEORGE,EGERTON TERRENCE ARTHUR
Format: Patent
Sprache:eng
Schlagworte:
CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:An electrochemical device comprising: (a) a semiconductor layer, wherein the semiconductor is silicon or silicon carbide, and where the layer has a thickness from 1 to 1000 [mu]m; (b) a TiO2 layer on the semiconductor layer, where the layer may include an alkaline earth oxide MO up to an amount where the layer is MtiO3, and where the layer has a thickness from 5 nm to 1 mm; (c) a grid of inert metal on the TiO2 layer, arranged so as to be able to apply a electric field across the TiO2 layer; and (d) an ohmic contact on the semiconductor layer.