Plasma reactor apparatus with independent capacitive and toroidal plasma sources

The invention discloses a plasma reactor for treating the workpiece, comprising a cover and a workpiece support in the chamber constructuring the reactor, wherein the cover comprises a top facing to the workpiece support; a toroidal plasma source having an RF power applicator comprising a hollowed reentrant conduit and approaching part of the reentrant exterior conduit, wherein the hollowed reentrant conduit at exterior of the chamber and has a pair of ends connected to the interior of the chamber and forms a closed loop passing the conduit and extending through the diameter of the workpiece support; and RF generator of the being coupled to the RF power applicator of the toroidal plasma source. The reactor further includes a capacitively coupled plasma source power applicator with an active power electrode and a VHF power generator, and a plasma bias power applicator with a bias power electrode and at least a first RF bias power generator.