Air-block structure

The air resistance structure comprises the base, polyvinyl alcohol or polymer film formed on the plastic film, and the compound film or vinyl chloride-acetate copolymer formed by the said polyvinyl alcohol or polymer film.

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Bibliographische Detailangaben
Hauptverfasser:	ZHANG HANZHANG, TIAN HONGLONG, LU QIMING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM PERFORMING OPERATIONS TRANSPORTING
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Beschreibung
Zusammenfassung:	The air resistance structure comprises the base, polyvinyl alcohol or polymer film formed on the plastic film, and the compound film or vinyl chloride-acetate copolymer formed by the said polyvinyl alcohol or polymer film.