Exposure device, exposure method, and micro device manufacturing method

An exposure device transfers by exposure an image of a pattern projected via an optical system having optical units (L1 to L13) onto an object (P). The exposure device includes a correction device for correcting a position of at least one image among the images projected onto the object (P) by the o...

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Bibliographische Detailangaben
1. Verfasser:	KATO MASAKI,SHIMIZU KENJI,TOGUCHI MANABU,WATANABETOMOYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An exposure device transfers by exposure an image of a pattern projected via an optical system having optical units (L1 to L13) onto an object (P). The exposure device includes a correction device for correcting a position of at least one image among the images projected onto the object (P) by the optical units (L1 to L13) so as to compensate the fluctuation of the optical units (L1 to L13).