Method for forming reinforced interconnects on a substrate

A method for forming reinforced interconnects or bumps on a substrate includes first forming a support structure on the substrate. A substantially filled capsule is then formed around the support structure to form an interconnect. The interconnect can reach a height of up to 300 microns.

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Bibliographische Detailangaben
1. Verfasser: SHIU HEI M.,CHAU ON L.,LAI GOR A.,YIP HENG K.,CHANG THOON K.,TAN LAN C
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method for forming reinforced interconnects or bumps on a substrate includes first forming a support structure on the substrate. A substantially filled capsule is then formed around the support structure to form an interconnect. The interconnect can reach a height of up to 300 microns.