Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate, the substrate table comprising a conditioning system configured to hold a conditioning fluid and to...

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Bibliographische Detailangaben
Hauptverfasser:	CUIJPERS MARTINUS AGNES W, VAN DER MEULEN FRITS, VAN GOMPEL EDWIN AUGUSTINUS M, DE JONG FREDERIK E, SIMONS WILHELMUS FRANCISCUS J, OTTENS JOOST J, SMEETS MARTIN F. P, LEENDERS MARTINUS HENDRIKUS A, VAN BAREN MARTIJN, CADEE THEODORUS P. M, KUSTERS GERARDUS ADRIANUS A. M, WIJCKMANS MAURICE, JANSEN ROB
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BLASTING CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY JOINTS OR FITTINGS FOR PIPES LIGHTING MATERIALS THEREFOR MEANS FOR THERMAL INSULATION IN GENERAL MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PIPES SEMICONDUCTOR DEVICES SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate, the substrate table comprising a conditioning system configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper in fluidcommunication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.