Lithographic apparatus and device manufacturing method

An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	BENSCHOP JOZEF PETRUS HENRICUS,BUTLER HANS,KEMPERNICOLAAS RUDOLF,KOEK BARTHOLOMEUS HENDRICUS,VAN DER MEULEN FRITS,VAN DER SCHOOT HARMEN KLAAS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.