Organosilane hardmask compositions and methods of producing semiconductor devices using the same

Provided herein are hardmask compositions that include an organosilane polymer prepared by the reaction of one or more compounds of Formula (I).

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Bibliographische Detailangaben
1. Verfasser:	UH DONG SEON,YUN HUI CHAN,LEE JIN KUK,OH CHANG IL,KIM JONG SEOB,KIM SANG-KYUN,LIM SANG HAK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided herein are hardmask compositions that include an organosilane polymer prepared by the reaction of one or more compounds of Formula (I).