Device for etching a conductive layer and etching method
The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a pluralit...
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| creator | MAZZARA CHRISTOPHE,GIRARD JAONA |
| description | The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a plurality of nozzles (50) which are arranged above the substrate and which are designed to spray simultaneously on the layer to be etched at least two solutions (7, 8), either independently of each other, or in the form of a mixture provided at the nozzles. |
| format | Patent |
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The invention is characterized in that the spraying means (5) consist of a plurality of nozzles (50) which are arranged above the substrate and which are designed to spray simultaneously on the layer to be etched at least two solutions (7, 8), either independently of each other, or in the form of a mixture provided at the nozzles.</description><language>eng</language><subject>APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS ; SEMICONDUCTOR DEVICES</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070919&DB=EPODOC&CC=CN&NR=101040067A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070919&DB=EPODOC&CC=CN&NR=101040067A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MAZZARA CHRISTOPHE,GIRARD JAONA</creatorcontrib><title>Device for etching a conductive layer and etching method</title><description>The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a plurality of nozzles (50) which are arranged above the substrate and which are designed to spray simultaneously on the layer to be etched at least two solutions (7, 8), either independently of each other, or in the form of a mixture provided at the nozzles.</description><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBwSS3LTE5VSMsvUkgtSc7IzEtXSFRIzs9LKU0uySxLVchJrEwtUkjMS4FL56aWZOSn8DCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSSeGc_QwNDAxMDAzNzR2Ni1AAA0Vwtxg</recordid><startdate>20070919</startdate><enddate>20070919</enddate><creator>MAZZARA CHRISTOPHE,GIRARD JAONA</creator><scope>EVB</scope></search><sort><creationdate>20070919</creationdate><title>Device for etching a conductive layer and etching method</title><author>MAZZARA CHRISTOPHE,GIRARD JAONA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101040067A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>MAZZARA CHRISTOPHE,GIRARD JAONA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MAZZARA CHRISTOPHE,GIRARD JAONA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Device for etching a conductive layer and etching method</title><date>2007-09-19</date><risdate>2007</risdate><abstract>The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a plurality of nozzles (50) which are arranged above the substrate and which are designed to spray simultaneously on the layer to be etched at least two solutions (7, 8), either independently of each other, or in the form of a mixture provided at the nozzles.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SEMICONDUCTOR DEVICES |
| title | Device for etching a conductive layer and etching method |
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