Device for etching a conductive layer and etching method
The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a pluralit...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is characterized in that the spraying means (5) consist of a plurality of nozzles (50) which are arranged above the substrate and which are designed to spray simultaneously on the layer to be etched at least two solutions (7, 8), either independently of each other, or in the form of a mixture provided at the nozzles. |
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