Integrated circuit and method for manufacturing

A semiconductor structure (5), fluid ejection device, and methods for manufacturing the same are provided, such that a contact to a substrate (10) is formed from a conductive layer (30).A fluid ejection device including: a substrate having a first surface having an non-doped region; a first insulati...

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1. Verfasser: DODD SIMON,WANG S. JONATHAN,TOM DENNIS W.,BRYANT FRANK R.,MCMAHON TERRY E.,MILLER RICHARD TODD,HINDMAN GREGORY T
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor structure (5), fluid ejection device, and methods for manufacturing the same are provided, such that a contact to a substrate (10) is formed from a conductive layer (30).A fluid ejection device including: a substrate having a first surface having an non-doped region; a first insulative material disposed on a portion of the first surface, the first insulative material having a plurality of openings forming a path to the first surface; a first conductive material disposed on the first insulative material, the first conductive material being disposed so that the plurality of openings are substantially free of the first conductive material; a second insulative material disposed on the first conductive material and portions of the first insulative material, the second insulative material being disposed so that the plurality of openings are substantial free of the second insulative material and a second conductive material being disposed on second insulative material and within plurality of openings so that some of the second conductive material disposed upon the second insulative material is in electrical contact with the non-doped region on the substrate.