Positive photosensitive resist release agent compositions

This invention discloses one positive light anti-erosion agent peeling agent combination, which comprises the following parts: a, occupying organic amine for weight of 10 to 50; b, monoethylene glycol monoalkyl ether for weigth of 0 to 70 percent; c, non photon electrode solvent for weight of 20 to...

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Bibliographische Detailangaben
1. Verfasser:	YIN XIYI,JIN SHENGPEI,ZHENG ZONGXUAN,PU XIZHEN,XIN CHENGJIAN,ZHANG XICHANG,JIN WEIRONG,XU SHUNFAN,JIN BINGYU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	This invention discloses one positive light anti-erosion agent peeling agent combination, which comprises the following parts: a, occupying organic amine for weight of 10 to 50; b, monoethylene glycol monoalkyl ether for weigth of 0 to 70 percent; c, non photon electrode solvent for weight of 20 to 90; d, based on the said three component total weight for 0.01 to 10 non-ion surface active agent. This invention relates to positive light anti-erosion peel agent combination to etch process with excellent solve property and peeling property of pattern film for light resistance.