Method of forming via hole using laser beam

Provided is a method of forming a via hole using a laser beam. The method includes forming a first hole in the first metal layer by irradiating a laser beam having a predetermined frequency; reducing an energy density of the laser beam having the same frequency; and forming a second hole correspondi...

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Bibliographische Detailangaben
1. Verfasser: SEONG CHEON-YA,CHO KWANG-WOO,KIM SEONG-HOON,YOU CHOONG-KI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Provided is a method of forming a via hole using a laser beam. The method includes forming a first hole in the first metal layer by irradiating a laser beam having a predetermined frequency; reducing an energy density of the laser beam having the same frequency; and forming a second hole corresponding to the first hole in the dielectric layer by irradiating the laser beam having the same frequency.