Fluorescent material manufacturing method, fluorescent material and plasma display panel
Damage of a fluorescent material main body due to an etching solution is suppressed. A fluorescent material manufacturing method is provided with a crushing process wherein fluorescent particles are crushed, and a surface treatment process wherein surface treatment is performed to fluorescent partic...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Damage of a fluorescent material main body due to an etching solution is suppressed. A fluorescent material manufacturing method is provided with a crushing process wherein fluorescent particles are crushed, and a surface treatment process wherein surface treatment is performed to fluorescent particles dispersed in a solvent, by adding the etching solution. An etching solution adding speed is in a range of 1.2x10-16-7.0x10-15 mol/min. per 1 m2 of specific surface area of the phosphor particles. |
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