Fluorescent material manufacturing method, fluorescent material and plasma display panel

Damage of a fluorescent material main body due to an etching solution is suppressed. A fluorescent material manufacturing method is provided with a crushing process wherein fluorescent particles are crushed, and a surface treatment process wherein surface treatment is performed to fluorescent partic...

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Bibliographische Detailangaben
1. Verfasser: GOAN KAZUYOSHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Damage of a fluorescent material main body due to an etching solution is suppressed. A fluorescent material manufacturing method is provided with a crushing process wherein fluorescent particles are crushed, and a surface treatment process wherein surface treatment is performed to fluorescent particles dispersed in a solvent, by adding the etching solution. An etching solution adding speed is in a range of 1.2x10-16-7.0x10-15 mol/min. per 1 m2 of specific surface area of the phosphor particles.