Loading pressure sputtering mfg. process of antobiosis textile material and its products

The present invention relates to negative pressure sputtering process for making antibiotic fabric material and the product. The process includes the plasma pre-treatment of the base textile, and the subsequent sputtering atom and molecule level Ag, Cu or TiO2 onto the surface of the base textile at...

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1. Verfasser: JUXIAN ZHOU
Format: Patent
Sprache:eng
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Zusammenfassung:The present invention relates to negative pressure sputtering process for making antibiotic fabric material and the product. The process includes the plasma pre-treatment of the base textile, and the subsequent sputtering atom and molecule level Ag, Cu or TiO2 onto the surface of the base textile at negative pressure. The antibiotic fabric product consists of base textile of woven or non-woven synthesized fiber fabric and sputtered atom and molecule level Ag, Cu or TiO2 onto the surface of the base textile. The present invention has the advantages of simultaneous preparation and loading of the Ag, Cu or TiO2 antiseptic, compact and firm coating, etc.