Spin transistor and manufacturing method thereof

The invention discloses a spin transistor and manufacturing method, it using lithography process for the regional definition on the substrate, and then using ion implantation method to form doped area, and on the substrate, forming magnetoresistance films, and eventually, producing the spin transist...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG DERUI, HUANG YINGWEN, YAO YONGDE, ZHU CHAOJU, LU ZHIQUAN, XIE LANQING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!