Semiconductor device

The degree of integration and the number of rewriting of a semiconductor device having a nonvolatile memory element are improved. A first MONOS nonvolatile-memory-element and a second MONOS nonvolatile-memory-element having a large gate width compared with the first MONOS nonvolatile-memory-element...

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Bibliographische Detailangaben
Hauptverfasser: SAKAI TAKESHI, KANAMARU YASUHIRO, MANABE YUKIKO, OKUYAMA KOUSUKE, KAWASHIMA YOSHIYUKI, ITO FUMITOSHI, ISHII YASUSHI, HASHIMOTO TAKASHI, MIZUNO MAKOTO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The degree of integration and the number of rewriting of a semiconductor device having a nonvolatile memory element are improved. A first MONOS nonvolatile-memory-element and a second MONOS nonvolatile-memory-element having a large gate width compared with the first MONOS nonvolatile-memory-element are mounted together on the same substrate, and the first MONOS nonvolatile-memory-element is used for storing program data which is scarcely rewritten, and the second MONOS nonvolatile-memory-element is used for storing processed data which is frequently rewritten.