Cleaning agent composition

To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of po...

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1. Verfasser: INOUE KAFUMI
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Sprache:chi ; eng
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creator INOUE KAFUMI
description To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of polishing optical subjects such as lenses and has. This cleanser composition is characterized by comprising 75 to 25 wt.% of an alkylene glycol alkyl ether such as dipropylene glycol monomethyl ether or dipropylene glycol dimethyl ether and 25 to 75 wt % of a 10 to 15C cycloparaffin such as cyclodecane, cycloundecane or cyclododecane.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN100500821CC</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN100500821CC</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN100500821CC3</originalsourceid><addsrcrecordid>eNrjZJByzklNzMvMS1dITE_NK1FIzs8tyC_OLMnMz-NhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGBqYGBhZGhs7OxkQpAgCYNSOT</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Cleaning agent composition</title><source>esp@cenet</source><creator>INOUE KAFUMI</creator><creatorcontrib>INOUE KAFUMI</creatorcontrib><description>To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of polishing optical subjects such as lenses and has. This cleanser composition is characterized by comprising 75 to 25 wt.% of an alkylene glycol alkyl ether such as dipropylene glycol monomethyl ether or dipropylene glycol dimethyl ether and 25 to 75 wt % of a 10 to 15C cycloparaffin such as cyclodecane, cycloundecane or cyclododecane.</description><language>chi ; eng</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; CANDLES ; CHEMISTRY ; DETERGENT COMPOSITIONS ; DETERGENTS ; FATTY ACIDS THEREFROM ; METALLURGY ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090617&amp;DB=EPODOC&amp;CC=CN&amp;NR=100500821C$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090617&amp;DB=EPODOC&amp;CC=CN&amp;NR=100500821C$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>INOUE KAFUMI</creatorcontrib><title>Cleaning agent composition</title><description>To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of polishing optical subjects such as lenses and has. This cleanser composition is characterized by comprising 75 to 25 wt.% of an alkylene glycol alkyl ether such as dipropylene glycol monomethyl ether or dipropylene glycol dimethyl ether and 25 to 75 wt % of a 10 to 15C cycloparaffin such as cyclodecane, cycloundecane or cyclododecane.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJByzklNzMvMS1dITE_NK1FIzs8tyC_OLMnMz-NhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGBqYGBhZGhs7OxkQpAgCYNSOT</recordid><startdate>20090617</startdate><enddate>20090617</enddate><creator>INOUE KAFUMI</creator><scope>EVB</scope></search><sort><creationdate>20090617</creationdate><title>Cleaning agent composition</title><author>INOUE KAFUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN100500821CC3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2009</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>INOUE KAFUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>INOUE KAFUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cleaning agent composition</title><date>2009-06-17</date><risdate>2009</risdate><abstract>To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of polishing optical subjects such as lenses and has. This cleanser composition is characterized by comprising 75 to 25 wt.% of an alkylene glycol alkyl ether such as dipropylene glycol monomethyl ether or dipropylene glycol dimethyl ether and 25 to 75 wt % of a 10 to 15C cycloparaffin such as cyclodecane, cycloundecane or cyclododecane.</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
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subjects ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
title Cleaning agent composition
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T07%3A29%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=INOUE%20KAFUMI&rft.date=2009-06-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN100500821CC%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true