Cleaning agent composition

To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of po...

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Bibliographische Detailangaben
1. Verfasser: INOUE KAFUMI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:To provide a cleanser composition with a high cleansing powers against the fixing agents and the protecting films without using halogen-based solvents, fluorine-based solvents and aromatic solvents against which affections are feared for removing fixing agents and protecting films in processes of polishing optical subjects such as lenses and has. This cleanser composition is characterized by comprising 75 to 25 wt.% of an alkylene glycol alkyl ether such as dipropylene glycol monomethyl ether or dipropylene glycol dimethyl ether and 25 to 75 wt % of a 10 to 15C cycloparaffin such as cyclodecane, cycloundecane or cyclododecane.