Large-area and low-power laser stripping method for GaN-base epitaxial layer
A method for stripping large-area GaN-based epitaxial layer by low-power laser features that the pulse laser beam is used to scan the GaN-loased epitaxial film grown on the sapphire substrate from outside to inside while the sapphire substrate is heated and the laser threshold is biased.
Gespeichert in:
Hauptverfasser: | , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | KNAG XIANGNING YANG ZHIJIAN HU XIAODONG QIN ZHIXING ZHANG PEI CHEN ZHIZHONG ZHANG GUOYI CHEN HAOMING YU TONGJUN |
description | A method for stripping large-area GaN-based epitaxial layer by low-power laser features that the pulse laser beam is used to scan the GaN-loased epitaxial film grown on the sapphire substrate from outside to inside while the sapphire substrate is heated and the laser threshold is biased. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN100463102CC</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN100463102CC</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN100463102CC3</originalsourceid><addsrcrecordid>eNqNijEOwjAMALMwoMIfLPZIKUV8IIIyVJ3YK0PdNlJILCdS4fdk4AEsd8PdVnUdykwahRAwjODjqjmuJOAxFaYsjtmFGV6UlzjCFAVa7PWjZCB2Gd8Ofbk_JDu1mdAn2v9cqcP1crc3TRwHSoxPCpQH29fGnM5NbY7WNn9NX7eKNaw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Large-area and low-power laser stripping method for GaN-base epitaxial layer</title><source>esp@cenet</source><creator>KNAG XIANGNING ; YANG ZHIJIAN ; HU XIAODONG ; QIN ZHIXING ; ZHANG PEI ; CHEN ZHIZHONG ; ZHANG GUOYI ; CHEN HAOMING ; YU TONGJUN</creator><creatorcontrib>KNAG XIANGNING ; YANG ZHIJIAN ; HU XIAODONG ; QIN ZHIXING ; ZHANG PEI ; CHEN ZHIZHONG ; ZHANG GUOYI ; CHEN HAOMING ; YU TONGJUN</creatorcontrib><description>A method for stripping large-area GaN-based epitaxial layer by low-power laser features that the pulse laser beam is used to scan the GaN-loased epitaxial film grown on the sapphire substrate from outside to inside while the sapphire substrate is heated and the laser threshold is biased.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CLADDING OR PLATING BY SOLDERING OR WELDING ; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING ; DEVICES USING STIMULATED EMISSION ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MACHINE TOOLS ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SOLDERING OR UNSOLDERING ; TRANSPORTING ; WELDING ; WORKING BY LASER BEAM</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090218&DB=EPODOC&CC=CN&NR=100463102C$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090218&DB=EPODOC&CC=CN&NR=100463102C$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KNAG XIANGNING</creatorcontrib><creatorcontrib>YANG ZHIJIAN</creatorcontrib><creatorcontrib>HU XIAODONG</creatorcontrib><creatorcontrib>QIN ZHIXING</creatorcontrib><creatorcontrib>ZHANG PEI</creatorcontrib><creatorcontrib>CHEN ZHIZHONG</creatorcontrib><creatorcontrib>ZHANG GUOYI</creatorcontrib><creatorcontrib>CHEN HAOMING</creatorcontrib><creatorcontrib>YU TONGJUN</creatorcontrib><title>Large-area and low-power laser stripping method for GaN-base epitaxial layer</title><description>A method for stripping large-area GaN-based epitaxial layer by low-power laser features that the pulse laser beam is used to scan the GaN-loased epitaxial film grown on the sapphire substrate from outside to inside while the sapphire substrate is heated and the laser threshold is biased.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CLADDING OR PLATING BY SOLDERING OR WELDING</subject><subject>CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MACHINE TOOLS</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOLDERING OR UNSOLDERING</subject><subject>TRANSPORTING</subject><subject>WELDING</subject><subject>WORKING BY LASER BEAM</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijEOwjAMALMwoMIfLPZIKUV8IIIyVJ3YK0PdNlJILCdS4fdk4AEsd8PdVnUdykwahRAwjODjqjmuJOAxFaYsjtmFGV6UlzjCFAVa7PWjZCB2Gd8Ofbk_JDu1mdAn2v9cqcP1crc3TRwHSoxPCpQH29fGnM5NbY7WNn9NX7eKNaw</recordid><startdate>20090218</startdate><enddate>20090218</enddate><creator>KNAG XIANGNING</creator><creator>YANG ZHIJIAN</creator><creator>HU XIAODONG</creator><creator>QIN ZHIXING</creator><creator>ZHANG PEI</creator><creator>CHEN ZHIZHONG</creator><creator>ZHANG GUOYI</creator><creator>CHEN HAOMING</creator><creator>YU TONGJUN</creator><scope>EVB</scope></search><sort><creationdate>20090218</creationdate><title>Large-area and low-power laser stripping method for GaN-base epitaxial layer</title><author>KNAG XIANGNING ; YANG ZHIJIAN ; HU XIAODONG ; QIN ZHIXING ; ZHANG PEI ; CHEN ZHIZHONG ; ZHANG GUOYI ; CHEN HAOMING ; YU TONGJUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN100463102CC3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2009</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CLADDING OR PLATING BY SOLDERING OR WELDING</topic><topic>CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MACHINE TOOLS</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOLDERING OR UNSOLDERING</topic><topic>TRANSPORTING</topic><topic>WELDING</topic><topic>WORKING BY LASER BEAM</topic><toplevel>online_resources</toplevel><creatorcontrib>KNAG XIANGNING</creatorcontrib><creatorcontrib>YANG ZHIJIAN</creatorcontrib><creatorcontrib>HU XIAODONG</creatorcontrib><creatorcontrib>QIN ZHIXING</creatorcontrib><creatorcontrib>ZHANG PEI</creatorcontrib><creatorcontrib>CHEN ZHIZHONG</creatorcontrib><creatorcontrib>ZHANG GUOYI</creatorcontrib><creatorcontrib>CHEN HAOMING</creatorcontrib><creatorcontrib>YU TONGJUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KNAG XIANGNING</au><au>YANG ZHIJIAN</au><au>HU XIAODONG</au><au>QIN ZHIXING</au><au>ZHANG PEI</au><au>CHEN ZHIZHONG</au><au>ZHANG GUOYI</au><au>CHEN HAOMING</au><au>YU TONGJUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Large-area and low-power laser stripping method for GaN-base epitaxial layer</title><date>2009-02-18</date><risdate>2009</risdate><abstract>A method for stripping large-area GaN-based epitaxial layer by low-power laser features that the pulse laser beam is used to scan the GaN-loased epitaxial film grown on the sapphire substrate from outside to inside while the sapphire substrate is heated and the laser threshold is biased.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN100463102CC |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS CLADDING OR PLATING BY SOLDERING OR WELDING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SOLDERING OR UNSOLDERING TRANSPORTING WELDING WORKING BY LASER BEAM |
title | Large-area and low-power laser stripping method for GaN-base epitaxial layer |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T06%3A32%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KNAG%20XIANGNING&rft.date=2009-02-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN100463102CC%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |