Single MEVVA ion source diffusion coating composite treating process

This invention publishes a kind of seeping-injecting-plating compound treatment for single MEVVA ion source. And the technical problem this invention will solve is the low efficiency of filling ion. Firstly, after the work-piece is put onto the work-piece shelf, the air in the vacuum furnace should be pumped until the air pressure is below 0.005Pa. Secondly, new gas should be filled into the vacuum furnace to make the degree of vacuum between 0.01Pa and 0.07 Pa. Thirdly, open the ion source and adjust filling the air, so as to make the mean free path of the metal ion and the gas atom between 1/10 and 1/2 of the distance from the ion source to the work-piece. At last, when the filling dose reaches 1.5E17 ions/square centimeter-3.5E17 ions/square centimeter, turn off the ion source. To compare this invention to the existing technology, it fills gas in the vacuum arc ion source MEVVA ion filling machine, and though adjusting filling the gas, multiple filling is realized. It also realizes ion-filling and surface