Method and apparatus for measuring wavefront aberrations

An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device (128) for reflecting selected portions of the wavefront (126), an imaging device (132) for capturing information related to the selected portions, and a processor (136) for calculating aberration...

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Bibliographische Detailangaben
1. Verfasser:	B.A. DAVIS,M.J. COLLINS,D.R. ISKANDER
Format:	Patent
Sprache:	eng
Schlagworte:	COLORIMETRY DIAGNOSIS HUMAN NECESSITIES HYGIENE IDENTIFICATION MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING MEDICAL OR VETERINARY SCIENCE PHYSICS RADIATION PYROMETRY SURGERY TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device (128) for reflecting selected portions of the wavefront (126), an imaging device (132) for capturing information related to the selected portions, and a processor (136) for calculating aberrations of the wavefront from the captured information. The method comprises reflecting selected portions of a wavefront (126) onto the imaging device (132), capturing information related to the selected portions, and processing the captured information to derive the aberrations.