LASERSTRAHLUNGSFESTES ABSORPTIONSFREIES OXIDISCHES SCHICHTOPTISCHES BAUELEMENT UND VERFAHREN ZU SEINER HERSTELLUNG

The invention relates to a laser radiation-resistant absorption-free oxidic film-optical component and a process for its production. The invention can be used in the construction of optical equipment, in microelectronics, optoelectronics and in the field of integrated optics. The process can be employed for producing such components in all known vacuum-coating plants. The aim of the invention is to provide an absorption-free optical thin-film component with high laser radiation resistance and to specify an economical production process for such components. The object arising from this is to find possible ways of directly increasing the laser radiation resistance of the individual films themselves even during their preparation process. The object is achieved by a laser radiation-resistant absorption-free optical thin-film component in which the oxygen content of the films is at least 2% greater than is necessary to maintain complete stoichiometry. The process for producing such components is characterised by the selection and corresponding variation of process parameters during the vacuum-coating process, so that an additional incorporation in the film of more than 2% of oxygen that is necessary for complete stoichiometry is ensured.